Boston Micro Fabrication (BMF) announces the grant of U.S. Patent No. 12,420,486 B2 for a “Multi-Scale System for Projection Micro Stereolithography.” The intellectual property describes an optical dual-resolution concept used in the microArch D1025 that switches exposure between two imaging scales within a single beam path. The goal is to combine high fidelity with a larger processing window and stable tolerances.
At the core of the architecture is the integration of multiple projection objectives with different imaging ratios—such as 10-µm and 25-µm pixel sizes—into a common optical path. The slicer or print controller allocates fine 10-µm exposures for critical features and uses 25-µm exposures for planar areas to reduce build time. In practice, this is intended to achieve more isotropic mechanical properties and more uniform dimensional accuracy across complex geometries without artificially restricting the build envelope.
“This patent reinforces our leadership in ultra-high-precision additive manufacturing,” said John Kawola, CEO of Boston Micro Fabrication. “The dual-resolution architecture delivers a unique combination of speed and accuracy, allowing engineers to fabricate micro parts with both intricate fine features and larger geometries in a single print.”
The patent was granted on September 23, 2025; the inventors listed are Dr. Chunguang Xia and Dr. Jiawen Xu, and it is assigned to BMF Material Technology Inc. in Shenzhen. The technology targets applications in medical technology, electronics, photonics, and microfluidics, where PµSL is established due to its fine lateral resolution and low roughness.
“The microArch D1025 embodies our mission to push the limits of what’s possible at the microscale,” added Dr. Xia, BMF Co-Founder and Chief Technology Officer. “This dual-resolution system is not only a major optical breakthrough—it’s a platform that enables the next generation of micro-fabricated devices.”
The microArch D1025 came to market in 2024 and implements product-level switching between 10-µm and 25-µm modes. According to the company, manufacturers of medical and electronic components in particular use the system when short cycle times and reproducible feature sizes in the double-digit micrometer range are required. The patent grant underpins the technical direction: more throughput in PµSL micro-manufacturing without neglecting the precise imaging of small features.
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