The central element of the new demo lab is the Quantum X align, a high-performance system for 3D laser lithography with automated alignment on existing substrates. The process enables the direct printing of complex microstructures on optical fibers, photonic chips, or wafers, thereby addressing requirements from integrated optics and semiconductor technology. According to Nanoscribe, the focus is on reproducible positioning accuracy and the integration of additive processes into existing manufacturing chains.
“The Shanghai Quantum X demolab is more than a local facility – it represents a milestone in our long-term commitment to the Chinese market,” said Martin Hermatschweiler, CEO and Co-founder of Nanoscribe. “By providing access to high-throughput two-photon lithography instrumentation, we enable our customers to accelerate development cycles and bridge the gap from academic proof of concept to industrial-scale production. This is how we actively support the transition from ‘lab to fab’,” he concluded.
Technical details were explained by Wanyin Cui. The company’s proprietary two-photon grayscale lithography enables continuous voxel modulation with several thousand grayscale levels and significantly increases throughput compared with conventional processes, without compromising shape accuracy. In addition, aligned two-photon lithography provides lateral alignment accuracy on the order of 100 nanometers, which is particularly relevant for photonic coupling elements.
As part of an accompanying symposium, applications from photonics, micro-optics, and medical technology were discussed. The demo lab is now in permanent operation and serves as a platform for feasibility studies, training, and joint development projects. With this, Nanoscribe positions itself in China as a technology partner for precise 3D microprinting in research and industry.