With IPX-Clear, Nanoscribe has developed a new printing material that is characterized by high transparency across the entire visible spectrum and precise shape accuracy. The new photoresist has been specially designed for the production of micro-optics using two-photon polymerization (2PP). Its properties are said to be particularly important for applications in imaging, sensor and display technology.
The material has been optimized for additive manufacturing using 3D printing by 2GL® technology and is compatible with established two-photon polymerization. Thanks to its high transmission in the visible wavelength range from 380 to 780 nanometers, IPX-Clear enables low-loss light guidance and high optical efficiency. Adjacent spectral ranges, such as in the UV-A and near-infrared range, also benefit from the special material composition.
“IPX-Clear combines properties that make it the ideal 2PP material for optics. It outperforms previously used materials in almost every respect and offers superior transparency, reproducible shape fidelity and outstanding surface quality,” says Dr. Simon Thiele, CTO of Printoptix, summarizing the qualities of the new photoresist after extensive testing.
Another feature of the material is its low surface roughness of less than 10 nanometers, which makes it particularly suitable for high-resolution micro-optical structures. In addition, the photoresist supports the production of optics in various sizes, from micrometer-sized structures to components several millimetres in size.
With IPX-Clear, Nanoscribe is responding to the increasing demands for highly transparent, precisely manufactured optical components. The material could play a decisive role in the further development of micro-optical systems in the future.
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